The LEAP 4000X HRTM is a high performance 3D atom probe microscope which provides nano-scale surface, bulk and interfacial materials analysis of simple and complex structures with atom by atom identification and accurate spatial positioning.
The system works using the principle of field evaporation, whereby a strong electric field applied to the specimen is sufficient to cause removal of atoms by ionization. Atom removal is triggered either via a voltage or laser pulse applied to the sample.
The LEAP HR provides the following key features:
"LEAP" is derived from Local ElectrodeTM Atom Probe. The Local ElectrodeTM provides a strong technological advantage over systems which do not have one, improving both ease of use and data quality. The Local Electrode also enables the use of prefabricated MicrotipTM arrays. Using these enables multiple analytical specimens to be prepared, mounted and loaded into the instrument for maximum efficiency with multi experiment scenarios.
The LEAP 4000X HR utilizes a novel energy compensated design that combines optimized mass resolution performance for detailed mass spectral interpretation, with wide Field-of-view (250 nm achievable). For voltage pulsing applications (traditionally metals), the performance is excellent and the system provides very high atom probe mass resolution.
The system uses a UV laser with a tightly focused spot. The small UV laser spot enables exceptional mass resolution to be obtained. The use of UV wavelength enables a wide variety of materials, including many insulators, to be analyzed with good yield. High specimen throughput is obtained by achieving fast pulse repetition rates. For laser pulsing applications, the LEAP 4000X HR also provides excellent mass resolving power at full Field from the tightly focused UV laser spot and long ion flight times.
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